Podkladová báze pod gel-lak Palu Base For Gel

Urethane Acrylate, Isopropylidenediphenyl Bisoxyhydroxypropyl Methacrylate, HEMA,  Isobornyl Methacrylate, Cellulose Acetate Butyrate, Hydroxycyclohexyl Phenyl Ketone, HEMA Phosphate, Ethyl Trimethylbenzoyl Phenylphosphinate, Silica Dimethyl Silylate, Polyhydroxycarboxylic Acid Amides, PPG-3, Hydroquinone, p-Hydroxyanisole, Polyether Acrylate, Dipropylene Glycol Diacrylate, Polyester Acylate +/- Mica, CI 77891, CI 74260, CI 74160, CI 60725, CI 45410, CI 77742, CI 77491, CI 77492, CI 77499, CI 19140, CI 77007.